Correlation between optical, morphological and compositional properties of aluminum nitride thin films by pulsed laser deposition

AlN thin films were grown in a N2 atmosphere onto a Si/Si3N4 substrate by pulsed laser ablation. We have varied the substrate temperature for the thin film growth, using X-ray Reflectometry (XRR) analysis, we have characterized the thickness and density of the thin layer and the interface roughness...

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Detalles Bibliográficos
Autor Principal: Pérez Taborda, Jaime Andrés; Riascos Landázury, Henry; Vera Londoño, Liliana Patricia
Formato: Artículo (Article)
Lenguaje:Desconocido (Unknown)
Publicado: IEEE Sensors Journal; Volume: 16, No. 2 2015
Materias:
Acceso en línea:http://babel.banrepcultural.org/cdm/ref/collection/p17054coll23/id/690