Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications

In this work, we measure the thermal and thermoelectric properties of large-area Si 0.8 Ge 0.2 nano-meshed films fabricated by DC sputtering of Si 0.8 Ge 0.2 on highly ordered porous alumina matrices. The Si 0.8 Ge 0.2 film replicated the porous alumina structure resulting in nano-meshed films. Very...

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Autor Principal: Pérez Taborda, Jaime Andrés; Muñoz Rojo, Miguel; Maíz, Jon; Neophytou, Neophytos; Martín González, Marisol
Formato: Artículo (Article)
Lenguaje:Desconocido (Unknown)
Publicado: Scientific Reports; Vol. 6, Número de artículo 32778 2016
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Acceso en línea:http://babel.banrepcultural.org/cdm/ref/collection/p17054coll23/id/496
id ir-p17054coll23-496
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spelling ir-p17054coll23-4962020-09-29 Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications Pérez Taborda, Jaime Andrés; Muñoz Rojo, Miguel; Maíz, Jon; Neophytou, Neophytos; Martín González, Marisol In this work, we measure the thermal and thermoelectric properties of large-area Si 0.8 Ge 0.2 nano-meshed films fabricated by DC sputtering of Si 0.8 Ge 0.2 on highly ordered porous alumina matrices. The Si 0.8 Ge 0.2 film replicated the porous alumina structure resulting in nano-meshed films. Very good control of the nanomesh geometrical features (pore diameter, pitch, neck) was achieved through the alumina template, with pore diameters ranging from 294±5nm down to 31±4 nm. Silicio Germanio; Termoelectricos; Plasma Ciencias naturales y matemáticas; Ciencias naturales y matemáticas / Física 2016 Scientific Reports; Vol. 6, Número de artículo 32778 PDF Artículo ENG - Inglés Colfuturo © Derechos reservados del autor http://babel.banrepcultural.org/cdm/ref/collection/p17054coll23/id/496
institution Biblioteca Virtual Banco de la República - Colecciones digitales
collection Custom
language Desconocido (Unknown)
topic Silicio Germanio; Termoelectricos; Plasma
Ciencias naturales y matemáticas; Ciencias naturales y matemáticas / Física
spellingShingle Silicio Germanio; Termoelectricos; Plasma
Ciencias naturales y matemáticas; Ciencias naturales y matemáticas / Física
Pérez Taborda, Jaime Andrés; Muñoz Rojo, Miguel; Maíz, Jon; Neophytou, Neophytos; Martín González, Marisol
Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications
description In this work, we measure the thermal and thermoelectric properties of large-area Si 0.8 Ge 0.2 nano-meshed films fabricated by DC sputtering of Si 0.8 Ge 0.2 on highly ordered porous alumina matrices. The Si 0.8 Ge 0.2 film replicated the porous alumina structure resulting in nano-meshed films. Very good control of the nanomesh geometrical features (pore diameter, pitch, neck) was achieved through the alumina template, with pore diameters ranging from 294±5nm down to 31±4 nm.
format Artículo (Article)
author Pérez Taborda, Jaime Andrés; Muñoz Rojo, Miguel; Maíz, Jon; Neophytou, Neophytos; Martín González, Marisol
author_facet Pérez Taborda, Jaime Andrés; Muñoz Rojo, Miguel; Maíz, Jon; Neophytou, Neophytos; Martín González, Marisol
author_sort Pérez Taborda, Jaime Andrés; Muñoz Rojo, Miguel; Maíz, Jon; Neophytou, Neophytos; Martín González, Marisol
title Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications
title_short Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications
title_full Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications
title_fullStr Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications
title_full_unstemmed Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications
title_sort ultra-low thermal conductivities in large- area sige nanomeshes for thermoelectric applications
publisher Scientific Reports; Vol. 6, Número de artículo 32778
publishDate 2016
url http://babel.banrepcultural.org/cdm/ref/collection/p17054coll23/id/496
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score 12,131701