Ultra-low thermal conductivities in large- area SiGe nanomeshes for thermoelectric applications

In this work, we measure the thermal and thermoelectric properties of large-area Si 0.8 Ge 0.2 nano-meshed films fabricated by DC sputtering of Si 0.8 Ge 0.2 on highly ordered porous alumina matrices. The Si 0.8 Ge 0.2 film replicated the porous alumina structure resulting in nano-meshed films. Very...

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Detalles Bibliográficos
Autor Principal: Pérez Taborda, Jaime Andrés; Muñoz Rojo, Miguel; Maíz, Jon; Neophytou, Neophytos; Martín González, Marisol
Formato: Artículo (Article)
Lenguaje:Desconocido (Unknown)
Publicado: Scientific Reports; Vol. 6, Número de artículo 32778 2016
Materias:
Acceso en línea:http://babel.banrepcultural.org/cdm/ref/collection/p17054coll23/id/496