Synthesis and study of the substrate effect on morphological properties of intrinsic silicon thin films

In this work, microcrystalline Si intrinsicsurfaces has been grown on substrateCorning glass 7059, steel and typical wafersc-Si exhibiting (111) preferential orientation.Microcrystalline silicon samples were preparedfrom plasma enhanced chemical vapor method(PECVD). Mofology was studied by AtomicFor...

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Detalles Bibliográficos
Autores Principales: Dussan Cuenca, Anderson, Mesa Rodríguez, Fredy Giovanni, Hidalgo, Camilo
Formato: http://purl.org/coar/resource_type/c_6501
Lenguaje:Español (Spanish)
Publicado: Universidad Libre 2010
Acceso en línea:http://hdl.handle.net/10901/15185