Synthesis and study of the substrate effect on morphological properties of intrinsic silicon thin films
In this work, microcrystalline Si intrinsicsurfaces has been grown on substrateCorning glass 7059, steel and typical wafersc-Si exhibiting (111) preferential orientation.Microcrystalline silicon samples were preparedfrom plasma enhanced chemical vapor method(PECVD). Mofology was studied by AtomicFor...
| Autores Principales: | , , |
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| Formato: | http://purl.org/coar/resource_type/c_6501 |
| Lenguaje: | Español (Spanish) |
| Publicado: |
Universidad Libre
2010
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| Acceso en línea: | http://hdl.handle.net/10901/15185 |