TiO2 and Co multilayer thin films via DC magnetron sputtering at room temperature: Interface properties
In this work, we prepared TiO2 and Co multilayer thin films via DC magnetron sputtering method on (100) GaAs and (100) Si substrates. The power for each target (TiO2 and Co), deposition time of the layers, and pressure during deposition were kept constant. From XRD, Raman, and IR measurements, the f...
Autores Principales: | , , , , , |
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Formato: | Artículo (Article) |
Lenguaje: | Inglés (English) |
Publicado: |
Elsevier Inc.
2020
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Materias: | |
Acceso en línea: | https://repository.urosario.edu.co/handle/10336/22558 https://doi.org/10.1016/j.matchar.2020.110293 |