TiO2 and Co multilayer thin films via DC magnetron sputtering at room temperature: Interface properties

"In this work, we prepared TiO2 and Co multilayer thin films via DC magnetron sputtering method on (100) GaAs and (100) Si substrates. The power for each target (TiO2 and Co), deposition time of the layers, and pressure during deposition were kept constant. From XRD, Raman, and IR measurements,...

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Detalles Bibliográficos
Autores Principales: "Quiroz, Heiddy P., Manso-Silván, M., Dussan, A., Busó-Rogero, Carlos, Prieto, P., Mesa, F."
Formato: Artículo (Article)
Lenguaje:Inglés (English)
Publicado: Elsevier Inc. 2020
Materias:
NVM
RBS
Acceso en línea:https://repository.urosario.edu.co/handle/10336/22558
https://doi.org/10.1016/j.matchar.2020.110293